|1||Strem Chemicals, Inc.||Bis(t-butylimido)bis(dimethylamino)tungsten(VI), min. 97% BTBMW|
|2||Sigma-Aldrich, Co. LLC||Bis(tert-butylimino)bis(dimethylamino)tungsten(VI)|
|3||Santa Cruz Biotechnology||Bis(tert-butylimino)bis(dimethylamino)tungsten(VI)|
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Your search for publications using this chemistry returned 5 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Al:WO3||Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization|
|2||WC||Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten|
|3||WN||Plasma-enhanced atomic layer deposition of tungsten nitride|
|4||WO3||Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma|
|5||WO3||The important role of water in growth of monolayer transition metal dichalcogenides|
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