DEZ, diethyl zinc, ZnEt2, CAS# 557-20-0
Where to buy
| Number | Vendor | Region | Link |
|---|
| 1 | EpiValence | π¬π§ | Zinc diethyl |
| 2 | Strem Chemicals, Inc. | πΊπΈ | Diethylzinc, min. 95%, contained in high-temp 50 ml cylinder for CVD/ALD |
| 3 | Pegasus Chemicals | π¬π§ | Diethylzinc |
| 4 | Strem Chemicals, Inc. | πΊπΈ | Diethylzinc, min. 95% (10 wt% in hexanes) (Sure/SealTM Bottle) |
| 5 | Strem Chemicals, Inc. | πΊπΈ | Diethylzinc, min. 95%, contained in 50 ml cylinder for CVD/ALD |
| 6 | Strem Chemicals, Inc. | πΊπΈ | Diethylzinc, min. 95% |
| 7 | Ereztech | πΊπΈ | Diethylzinc |
| 8 | DOCK/CHEMICALS | π©πͺ | Diethylzinc |
| 9 | Strem Chemicals, Inc. | πΊπΈ | Diethylzinc, elec. gr. (99.9998%-Zn) |
www.plasma-ald.com does not endorse any chemical suppliers. These links are provided for the benefit of our users. If a link goes bad, let us know.
If you would like your company's precursor products listed, or your existing listing changed or removed, send me an email.
Plasma Enhanced Atomic Layer Deposition Film Publications
Your search for publications using this chemistry returned 76 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
| Number | Title |
|---|
| 1 | Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD |
| 2 | Oxide TFT LC Oscillators on Glass and Plastic for Wireless Functions in Large-Area Flexible Electronic Systems |
| 3 | Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors |
| 4 | Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications |
| 5 | Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study |
| 6 | P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping |
| 7 | Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers |
| 8 | All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process |
| 9 | P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping |
| 10 | Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma |
| 11 | Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant |
| 12 | Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition |
| 13 | Fabrication and Characterization of Flexible Thin Film Transistors on Thin Solution-Cast Substrates |
| 14 | Fast PEALD ZnO Thin-Film Transistor Circuits |
| 15 | Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration |
| 16 | ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition |
| 17 | The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering |
| 18 | Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors |
| 19 | Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD |
| 20 | Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current |
| 21 | Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition |
| 22 | Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO |
| 23 | Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition |
| 24 | Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition |
| 25 | Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films |
| 26 | Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition |
| 27 | Encapsulation method for atom probe tomography analysis of nanoparticles |
| 28 | The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition |
| 29 | Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System |
| 30 | Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications |
| 31 | Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells |
| 32 | P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping |
| 33 | Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition |
| 34 | The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor |
| 35 | Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth |
| 36 | Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping |
| 37 | Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges |
| 38 | ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window" |
| 39 | Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices |
| 40 | Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices |
| 41 | Fast Flexible Plastic Substrate ZnO Circuits |
| 42 | Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays |
| 43 | Top-down fabricated ZnO nanowire transistors for application in biosensors |
| 44 | Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma |
| 45 | Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature |
| 46 | Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition |
| 47 | Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide |
| 48 | The Ξ± and Ξ³ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges |
| 49 | P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping |
| 50 | The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO |
| 51 | Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique |
| 52 | Plasma-enhanced atomic layer deposition of zinc phosphate |
| 53 | Hysteresis behaviour of top-down fabricated ZnO nanowire transistors |
| 54 | Oxide semiconductor thin film transistors on thin solution-cast flexible substrates |
| 55 | Efficient Modification of Metal Oxide Surfaces with Phosphonic Acids by Spray Coating |
| 56 | Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment |
| 57 | Atomic layer deposition of high-mobility hydrogen-doped zinc oxide |
| 58 | Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition |
| 59 | Low-Power Double-Gate ZnO TFT Active Rectifier |
| 60 | Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition |
| 61 | Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions |
| 62 | Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition |
| 63 | A high speed PE-ALD ZnO Schottky diode rectifier with low interface-state density |
| 64 | The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition |
| 65 | New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping |
| 66 | Plasma enhanced atomic layer deposition of zinc sulfide thin films |
| 67 | Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition |
| 68 | Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films |
| 69 | Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell |
| 70 | Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells |
| 71 | Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell |
| 72 | Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition |
| 73 | Spectroscopy and control of near-surface defects in conductive thin film ZnO |
| 74 | Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices |
| 75 | Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces |
| 76 | Atomic layer deposition of high-mobility hydrogen-doped zinc oxide |
Innatiux is a retained executive recruiting firm with a focus on the search and placement of proven leaders for client companies in the field of high-tech capital equipment and analytical instrumentation. We are seeking WW technical and business leaders with a background in semiconductor deposition to fill confidential senior and executive level positions with our clients. Visit us at: www.innatiux.com
