Trimethyl Gallium, TMG, CAS# 1445-79-0

Where to buy

NumberVendorLink
1Strem Chemicals, Inc.Trimethylgallium, 99+%
2Strem Chemicals, Inc.Trimethylgallium, 99+%, contained in 50 ml cylinder for CVD/ALD
3Strem Chemicals, Inc.Trimethylgallium, elec. gr. (99.9999%-Ga)
4Strem Chemicals, Inc.Trimethylgallium, elec. gr. (99.9999%-Ga), contained in 50 ml electropolished cylinder for CVD/ALD
5EpiValenceGallium Trimethyl

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 36 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberCompositionTitle
1AlxGa1-xNGrowth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
2AlxGa1-xNHollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1-xN thin films at low temperatures
3AlxGa1-xNLow-temperature hollow cathode plasma-assisted atomic layer deposition of crystalline III-nitride thin films and nanostructures
4AlxGa1-xNOptical characteristics of nanocrystalline AlxGa1-xN thin films deposited by hollow cathode plasma-assisted atomic layer deposition
5Ga2O3Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
6Ga2O3Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
7Ga2O3Electrical characteristics of β-Ga2O3 thin films grown by PEALD
8Ga2O3Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
9Ga2O3Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
10Ga2O3Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
11Ga2O3Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
12Ga2O3RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
13Ga2O3Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
14GaNAtomic layer deposition of GaN at low temperatures
15GaNComparison of trimethylgallium and triethylgallium as 'Ga' source materials for the growth of ultrathin GaN films on Si(100) substrates via hollow-cathode plasma-assisted atomic layer deposition
16GaNEffect of substrate temperature and Ga source precursor on growth and material properties of GaN grown by hollow cathode plasma assisted atomic layer deposition
17GaNElectron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
18GaNElectronic and optical device applications of hollow cathode plasma assisted atomic layer deposition based GaN thin films
19GaNFabrication of flexible polymer-GaN core-shell nanofibers by the combination of electrospinning and hollow cathode plasma-assisted atomic layer deposition
20GaNGrowth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
21GaNGrowth kinetics for temperature-controlled atomic layer deposition of GaN using trimethylgallium and remote-plasma-excited NH3
22GaNHollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1-xN thin films at low temperatures
23GaNInfrared study on low temperature atomic layer deposition of GaN using trimethylgallium and plasma-excited ammonia
24GaNLow temperature thin film transistors with hollow cathode plasma-assisted atomic layer deposition based GaN channels
25GaNLow-temperature hollow cathode plasma-assisted atomic layer deposition of crystalline III-nitride thin films and nanostructures
26GaNLow-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
27GaNMetal-semiconductor-metal ultraviolet photodetectors based on gallium nitride grown by atomic layer deposition at low temperatures
28GaNOptical characteristics of nanocrystalline AlxGa1-xN thin films deposited by hollow cathode plasma-assisted atomic layer deposition
29GaNPerspectives on future directions in III-N semiconductor research
30GaNPlasma-Enhanced Atomic Layer Deposition of III-Nitride Thin Films
31GaNSelf-Limiting Growth of GaN at Low Temperatures
32GaNSelf-limiting growth of GaN using plasma-enhanced atomic layer deposition
33GaNTemperature-controlled atomic layer deposition of GaN using plasma-excited nitrogen source
34GaPStudy of GaP/Si Heterojunction Solar Cells
35GaPThin film GaP for solar cell application
36InGaNGrowth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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