AlCl3, Aluminum Trichloride, CAS# 7446-70-0

Informational Websites

NumberWebsite
1http://webbook.nist.gov/cgi/cbook.cgi?ID=7446-70-0

Where to buy

NumberVendorRegionLink
1DOCK/CHEMICALSπŸ‡©πŸ‡ͺAluminumtrichloride
2Santa Cruz BiotechnologyπŸ‡ΊπŸ‡ΈAluminum chloride anhydrous
3TCIπŸ‡ΊπŸ‡ΈAluminum(III) Chloride
4Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈAluminum chloride, anhydrous (99.99+%-Al) PURATREM
5Sigma-Aldrich, Co. LLCπŸ‡ΊπŸ‡ΈAluminum chloride anhydrous, powder, 99.999% trace metals basis
6EreztechπŸ‡ΊπŸ‡ΈAluminum chloride
7Alfa AesarπŸ‡ΊπŸ‡ΈAluminum chloride, anhydrous, 99.999% (metals basis)
8Pegasus ChemicalsπŸ‡¬πŸ‡§Aluminium chloride

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 9 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
2Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
3Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
4Formation of aluminum nitride thin films as gate dielectrics on Si(100)
5Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
6Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
7Radical Enhanced Atomic Layer Deposition of Metals and Oxides
8Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
9Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma