bis(dimethylamino-2-methyl-2-butoxo)nickel, [Ni(dmamb)2], CAS# 942311-35-5

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 3 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1Formation of Ni silicide from atomic layer deposited Ni
2Plasma-Enhanced Atomic Layer Deposition of Ni
3Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition


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