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3DMAAl, Tris(dimethylamido)aluminum(III), (Me2N)3Al, (Me2N)6Al2, CAS# 32093-39-3

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 2 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1Al2O3Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
2AlNTris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor


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