Hexachlorodisilane, Si2Cl6, CAS# 13465-77-5

Where to buy

NumberVendorRegionLink
1GelestπŸ‡ΊπŸ‡ΈHexachlorodisilane
2EntegrisπŸ‡ΊπŸ‡ΈHCDS-HP
3EpiValenceπŸ‡¬πŸ‡§Hexachloro disilane
4EreztechπŸ‡ΊπŸ‡ΈHexachlorodisilane

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 6 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma
2Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
3Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
4Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
5Atomic layer epitaxy of Si on Ge(100) using Si2Cl6 and atomic hydrogen
6Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces