Hexachlorodisilane, Si2Cl6, CAS# 13465-77-5

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberCompositionTitle
1SiNxChallenges in atomic layer deposition of carbon-containing silicon-based dielectrics
2SiNxLow-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma
3SiNxReactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
4SiO2Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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