Di(isopropylamino)Silane, (i-PrHN)2SiH2, DIPAS, CAS# 908831-34-5

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor


I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. If you know of publications I have missed or a database entry is wrong, send me an email at: marksowa@plasma-ald.com

Follow plasma-ald.com

Follow @PlasmaALDGuy


© 2014-2018 plasma-ald.com