Precursor Characterization Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Precursor Characterization returned 11 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic Layer Deposition of Gold Metal
2Copper-ALD Seed Layer as an Enabler for Device Scaling
3Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
4Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
5PEALD of Copper using New Precursors for Next Generation of Interconnections
6Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
7Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
8Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
9Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
10Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
11Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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