Transistor Characteristics Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Transistor Characteristics returned 33 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
2AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
3Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
4Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
5Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
6Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
7Controlling threshold voltage and leakage currents in vertical organic field-effect transistors by inversion mode operation
8DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
9Demonstration of flexible thin film transistors with GaN channels
10Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
11Electronic and optical device applications of hollow cathode plasma assisted atomic layer deposition based GaN thin films
12Gate Recessed Quasi-Normally OFF Al2O3/AlGaN/GaN MIS-HEMT With Low Threshold Voltage Hysteresis Using PEALD AlN Interfacial Passivation Layer
13Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
14Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
15High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
16Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
17Impact of gate insulator on the dc and dynamic performance of AlGaN/GaN MIS-HEMTs
18Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
19Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
20Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
21Low temperature thin film transistors with hollow cathode plasma-assisted atomic layer deposition based GaN channels
22Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
23Nitride passivation of the interface between high-k dielectrics and SiGe
24Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
25Photo-Patternable ZnO Thin Films Based on Cross-Linked Zinc Acrylate for Organic/Inorganic Hybrid Complementary Inverters
26Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
27Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
28Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
29Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
30The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
31Top-down fabricated ZnO nanowire transistors for application in biosensors
32Toward Understanding Positive Bias Temperature Instability in Fully Recessed-Gate GaN MISFETs
33Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal


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