Microstructure Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
2Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
3Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
4Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
5Texture of atomic layer deposited ruthenium
6Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
7Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
8Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
9Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
10Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
11Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
12Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition
13Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
14Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
15Microscopic origin of bipolar resistive switching of nanoscale titanium oxide thin films
16Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
17Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
18GeSbTe deposition for the PRAM application
19Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
20Island Coalescence during Film Growth: An Underestimated Limitation of Cu ALD
21Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
22Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
23Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
24Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
25Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
26Formation of Nano-Crystalline Ru-Based Ternary Thin Films by Plasma-Enhanced Atomic Layer Deposition
27Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
28Atomic layer deposition of GaN at low temperatures
29The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
30Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
31Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
32Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
33Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
34Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
35Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
36Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
37Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
38Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
39Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
40Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
41Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
42Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
43Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
44Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
45Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
46Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
47Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
48ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition
49Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
50Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
51Direct observation of microscopic change induced by oxygen vacancy drift in amorphous TiO2 thin films
52In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
53Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
54Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
55Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
56Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
57Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
58PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
59Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
60Ru thin film grown on TaN by plasma enhanced atomic layer deposition
61Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
62All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
63Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
64Gadolinium nitride films deposited using a PEALD based process
65Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
66Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
67Low temperature plasma enhanced deposition of GaP films on Si substrate
68Atmospheric pressure plasma enhanced spatial ALD of silver
69Optimization of Y2O3 dopant concentration of yttria stabilized zirconia thin film electrolyte prepared by plasma enhanced atomic layer deposition for high performance thin film solid oxide fuel cells
70Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
71Interface Properties of GaP/Si Heterojunction Fabricated by PE-ALD
72Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
73Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
74PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
75HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
76High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
77Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
78Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
79Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
80Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
81Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
82Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
83ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
84A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
85Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
86Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
87Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
88Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
89Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
90The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
91Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
92Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
93Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery
94Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
95Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
96Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
97Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
98Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
99Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
100AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
101Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
102The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
103Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier
104Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
105A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
106A route to low temperature growth of single crystal GaN on sapphire
107Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
108Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
109Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications
110Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition
111Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
112Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
113Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
114Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
115Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
116Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
117Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
118Layer-by-layer epitaxial growth of GaN at low temperatures
119Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
120Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
121Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
122Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
123Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
124Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
125Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
126Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
127Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
128Sub-7-nm textured ZrO2 with giant ferroelectricity
129Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
130TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
131A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
132Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
133Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
134Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
135Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
136Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
137MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
138A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
139Direct epitaxial nanometer-thin InN of high structural quality on 4H-SiC by atomic layer deposition
140Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
141Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
142Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
143Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
144The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
145Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
146Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
147Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
148Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
149Plasma-enhanced atomic layer deposition of Co on metal surfaces