Density Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Density returned 91 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
2A route to low temperature growth of single crystal GaN on sapphire
3Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
4Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
5Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
6Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
7Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
8Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
9Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
10Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
11Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
12Breakdown and Protection of ALD Moisture Barrier Thin Films
13Characteristics of an Al2O3 Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N2O Plasma
14Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
15Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
16Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
17Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
18Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
19Densification of Thin Aluminum Oxide Films by Thermal Treatments
20Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
21Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
22Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
23Energy transformation of plasmonic photocatalytic oxidation on 1D quantum well of platinum thin film
24Evaluation of plasma parameters on PEALD deposited TaCN
25Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
26GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
27Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
28Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
29High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
30High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
31High-Reflective Coatings For Ground and Space Based Applications
32Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1-xN thin films at low temperatures
33Hydrogen plasma-enhanced atomic layer deposition of copper thin films
34Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
35Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
36Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
37Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
38Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
39Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
40Low-temperature grown wurtzite InxGa1-xN thin films via hollow cathode plasma-assisted atomic layer deposition
41Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
42Low-temperature hollow cathode plasma-assisted atomic layer deposition of crystalline III-nitride thin films and nanostructures
43Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
44Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
45Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
46Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
47PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
48Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
49Plasma enhanced atomic layer deposition of SiNx:H and SiO2
50Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
51Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
52Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
53Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
54Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
55Plasma-Enhanced Atomic Layer Deposition of III-Nitride Thin Films
56Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
57Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
58Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
59Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
60Plasma-enhanced atomic layer deposition of superconducting niobium nitride
61Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
62Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
63Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
64Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
65Properties of AlN grown by plasma enhanced atomic layer deposition
66Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
67Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
68Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
69Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
70Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
71Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
72Remote Plasma ALD of Platinum and Platinum Oxide Films
73Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
74Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
75Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
76Room-Temperature Atomic Layer Deposition of Platinum
77Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
78Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
79Structural and optical characterization of low-temperature ALD crystalline AlN
80Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
81Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
82Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
83Substrate impact on the low-temperature growth of GaN thin films by plasma-assisted atomic layer deposition
84Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
85Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
86The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
87Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
88TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
89Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
90Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
91ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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