Chemical Composition, Impurities Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
2A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
3A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
4A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
5A New Pulse Plasma Enhanced Atomic Layer Deposition of Tungsten Nitride Diffusion Barrier for Copper Interconnect
6A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
7A route to low temperature growth of single crystal GaN on sapphire
8A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
9Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
10Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
11ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
12ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
13ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
14ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
15Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
16Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
17Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
18An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
19An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
20An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
21Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
22Analysis of nitrogen species in titanium oxynitride ALD films
23Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
24Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
25Atmospheric pressure plasma enhanced spatial ALD of silver
26Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
27Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
28Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
29Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
30Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
31Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
32Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
33Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
34Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
35Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
36Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
37Atomic layer deposition of GaN at low temperatures
38Atomic Layer Deposition of Gold Metal
39Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
40Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
41Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
42Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
43Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
44Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
45Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
46Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
47Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
48Atomic Layer Deposition of the Solid Electrolyte LiPON
49Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
50Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
51Atomic layer deposition of titanium nitride from TDMAT precursor
52Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
53Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
54Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
55Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
56Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
57Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
58Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
59Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
60Characteristics of an Al2O3 Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N2O Plasma
61Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
62Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
63Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
64Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
65Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
66Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
67Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
68Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
69Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
70Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
71Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
72Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
73Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
74Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
75Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
76Comparison of trimethylgallium and triethylgallium as 'Ga' source materials for the growth of ultrathin GaN films on Si(100) substrates via hollow-cathode plasma-assisted atomic layer deposition
77Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
78Composite materials and nanoporous thin layers made by atomic layer deposition
79Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
80Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
81Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
82Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
83Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
84Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
85Copper-ALD Seed Layer as an Enabler for Device Scaling
86Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
87Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
88Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
89Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
90Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
91Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
92Damage evaluation in graphene underlying atomic layer deposition dielectrics
93Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
94Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
95Densification of Thin Aluminum Oxide Films by Thermal Treatments
96Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
97Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
98Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
99Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
100Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
101Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
102Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
103Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
104Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
105Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
106Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
107Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition
108Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
109Effect of Reaction Mechanism on Precursor Exposure Time in Atomic Layer Deposition of Silicon Oxide and Silicon Nitride
110Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
111Effect of substrate temperature and Ga source precursor on growth and material properties of GaN grown by hollow cathode plasma assisted atomic layer deposition
112Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
113Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
114Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
115Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
116Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
117Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
118Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
119Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
120Effects of NH3 pulse plasma on atomic layer deposition of tungsten nitride diffusion barrier
121Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
122Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
123Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
124Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
125Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
126Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
127Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
128Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
129Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
130Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
131Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
132Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
133Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
134Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
135Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
136Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
137Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
138Evaluation of NbN thin films grown by MOCVD and plasma-enhanced ALD for gate electrode application in high-k/SiO2 gate stacks
139Evaluation of plasma parameters on PEALD deposited TaCN
140Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
141Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
142Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
143Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
144Fabrication of AlN/BN bishell hollow nanofibers by electrospinning and atomic layer deposition
145Fabrication of flexible polymer-GaN core-shell nanofibers by the combination of electrospinning and hollow cathode plasma-assisted atomic layer deposition
146Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
147Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
148Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
149Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
150Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
151Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
152Fully CMOS-compatible titanium nitride nanoantennas
153GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
154Gadolinium nitride films deposited using a PEALD based process
155GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
156Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
157Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
158Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
159Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
160Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
161Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
162Growth kinetics for temperature-controlled atomic layer deposition of GaN using trimethylgallium and remote-plasma-excited NH3
163Growth mechanism of Co thin films formed by plasma-enhanced atomic layer deposition using NH3 as plasma reactant
164Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
165Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
166Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
167HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
168High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
169High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
170High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
171High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
172High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
173High-Reflective Coatings For Ground and Space Based Applications
174Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
175Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
176Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
177Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1-xN thin films at low temperatures
178Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes
179Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
180Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
181Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
182Hydrogen plasma-enhanced atomic layer deposition of copper thin films
183Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
184Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
185Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
186Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
187Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
188Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
189Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
190Improved understanding of recombination at the Si/Al2O3 interface
191Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
192Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
193In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
194In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
195In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
196In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
197In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
198In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
199Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
200Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
201Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
202Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
203Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
204Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
205Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
206Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
207Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
208Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
209Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
210Infrared study on low temperature atomic layer deposition of GaN using trimethylgallium and plasma-excited ammonia
211Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
212Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
213Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
214Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
215Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
216Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
217Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
218Investigation of native oxide removing from HCPA ALD grown GaN thin films surface utilizing HF solutions
219Investigation of Tungsten Nitride Deposition Using Tungsten Hexafluoride Precursor for Via and Plug Metallization
220Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
221Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
222Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
223Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
224Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
225Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
226Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
227Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
228Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
229Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
230Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
231Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
232Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
233Low temperature temporal and spatial atomic layer deposition of TiO2 films
234Low temperature thin film transistors with hollow cathode plasma-assisted atomic layer deposition based GaN channels
235Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
236Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
237Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
238Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
239Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
240Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
241Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma
242Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
243Low-Temperature Deposition of Hexagonal Boron Nitride Via Sequential Injection of Triethylboron and N2/H2 Plasma
244Low-temperature grown wurtzite InxGa1-xN thin films via hollow cathode plasma-assisted atomic layer deposition
245Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
246Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
247Low-temperature hollow cathode plasma-assisted atomic layer deposition of crystalline III-nitride thin films and nanostructures
248Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
249Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
250Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
251Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
252Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
253Low-temperature self-limiting atomic layer deposition of wurtzite InN on Si(100)
254Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
255Low-temperature sequential pulsed chemical vapor deposition of ternary BxGa1-xN and BxIn1-xN thin film alloys
256Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
257Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
258MANOS performance dependence on ALD Al2O3 oxidation source
259Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
260Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
261Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
262Method to enhance atomic-layer deposition of tungsten-nitride diffusion barrier for Cu interconnect
263Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
264Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
265Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
266Nitride memristors
267Nitride passivation of the interface between high-k dielectrics and SiGe
268Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
269Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
270Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
271Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
272On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
273Optical and Electrical Properties of TixSi1-xOy Films
274Optical characteristics of nanocrystalline AlxGa1-xN thin films deposited by hollow cathode plasma-assisted atomic layer deposition
275Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
276Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
277Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
278Oxygen migration in TiO2-based higher-k gate stacks
279Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
280PEALD AlN: controlling growth and film crystallinity
281PEALD of Copper using New Precursors for Next Generation of Interconnections
282PEALD ZrO2 Films Deposition on TiN and Si Substrates
283Perspectives on future directions in III-N semiconductor research
284Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
285Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
286Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
287Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
288Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
289Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
290Plasma enhanced atomic layer deposition of Fe2O3 thin films
291Plasma enhanced atomic layer deposition of Ga2O3 thin films
292Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
293Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
294Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
295Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
296Plasma enhanced atomic layer deposition of SiNx:H and SiO2
297Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
298Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
299Plasma enhanced atomic layer deposition of zinc sulfide thin films
300Plasma Enhanced Atomic Layer Deposition on Powders
301Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
302Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
303Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
304Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
305Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
306Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
307Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
308Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
309Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
310Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
311Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
312Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
313Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
314Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
315Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
316Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
317Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
318Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
319Plasma-enhanced atomic layer deposition for plasmonic TiN
320Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
321Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
322Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
323Plasma-enhanced atomic layer deposition of BaTiO3
324Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
325Plasma-Enhanced Atomic Layer Deposition of III-Nitride Thin Films
326Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
327Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
328Plasma-Enhanced Atomic Layer Deposition of Ni
329Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
330Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
331Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
332Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
333Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
334Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
335Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
336Plasma-enhanced atomic layer deposition of superconducting niobium nitride
337Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
338Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
339Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
340Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
341Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
342Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
343Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
344Plasma-enhanced atomic layer deposition of tungsten nitride
345Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
346Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
347Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
348Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
349Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
350Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
351Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
352Properties of AlN grown by plasma enhanced atomic layer deposition
353Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
354Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
355Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
356Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
357Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
358Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
359Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
360Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
361Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
362Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
363Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
364Remote Plasma ALD of Platinum and Platinum Oxide Films
365Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
366Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
367Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
368Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
369Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
370Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
371Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
372Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
373Room temperature atomic layer deposition of TiO2 on gold nanoparticles
374Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
375Room-Temperature Atomic Layer Deposition of Platinum
376RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
377RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
378Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
379Ru thin film grown on TaN by plasma enhanced atomic layer deposition
380Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
381Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
382Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
383Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
384Self-Limiting Growth of GaN at Low Temperatures
385Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
386Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
387Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
388Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
389Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
390Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
391Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
392Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
393Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
394Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
395Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
396Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
397Structural and optical characterization of low-temperature ALD crystalline AlN
398Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
399Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
400Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
401Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
402Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
403Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
404Study on the characteristics of aluminum thin films prepared by atomic layer deposition
405Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
406Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
407Substrate impact on the low-temperature growth of GaN thin films by plasma-assisted atomic layer deposition
408Substrate temperature influence on the properties of GaN thin films grown by hollow-cathode plasma-assisted atomic layer deposition
409Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
410Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
411Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
412Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
413Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
414Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
415TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
416Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
417Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
418Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
419The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
420The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
421The effects of layering in ferroelectric Si-doped HfO2 thin films
422The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
423The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
424The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
425The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
426The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
427The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
428The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
429Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
430Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
431Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
432Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
433Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
434TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
435Trilayer Tunnel Selectors for Memristor Memory Cells
436Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
437Tuning The Photoactivity of Zirconia Nanotubes-Based Photoanodes via Ultrathin Layers of ZrN: An Effective Approach toward Visible-Light Water Splitting
438Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
439Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
440Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
441Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
442Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
443Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
444Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
445Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
446Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
447Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition
448Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
449Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
450X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
451ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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