Chemical Composition, Impurities Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
2A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
3A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
4A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
5A New Pulse Plasma Enhanced Atomic Layer Deposition of Tungsten Nitride Diffusion Barrier for Copper Interconnect
6A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
7A route to low temperature growth of single crystal GaN on sapphire
8A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
9Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
10Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
11ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
12ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
13ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
14ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
15Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
16AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
17Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
18Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
19An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
20An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
21An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
22Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
23Analysis of nitrogen species in titanium oxynitride ALD films
24Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
25Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
26Atmospheric pressure plasma enhanced spatial ALD of silver
27Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
28Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
29Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
30Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
31Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
32Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
33Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
34Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
35Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
36Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
37Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
38Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
39Atomic layer deposition of GaN at low temperatures
40Atomic Layer Deposition of Gold Metal
41Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
42Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
43Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
44Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
45Atomic Layer Deposition of Niobium Nitride from Different Precursors
46Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
47Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
48Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
49Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
50Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
51Atomic Layer Deposition of the Solid Electrolyte LiPON
52Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
53Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
54Atomic layer deposition of titanium nitride from TDMAT precursor
55Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
56Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
57Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
58Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
59Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
60Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
61Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
62Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
63Characteristics of an Al2O3 Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N2O Plasma
64Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
65Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
66Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
67Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
68Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
69Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
70Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
71Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
72Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
73Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
74Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
75Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
76Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
77Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
78Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
79Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
80Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
81Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
82Comparison of trimethylgallium and triethylgallium as 'Ga' source materials for the growth of ultrathin GaN films on Si(100) substrates via hollow-cathode plasma-assisted atomic layer deposition
83Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
84Composite materials and nanoporous thin layers made by atomic layer deposition
85Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
86Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
87Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
88Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
89Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
90Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
91Copper-ALD Seed Layer as an Enabler for Device Scaling
92Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
93Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
94Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
95Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
96Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
97Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
98Damage evaluation in graphene underlying atomic layer deposition dielectrics
99Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
100Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
101Densification of Thin Aluminum Oxide Films by Thermal Treatments
102Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
103Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
104Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
105Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
106Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
107Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
108Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
109Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
110Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
111Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
112Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
113Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
114Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition
115Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
116Effect of Reaction Mechanism on Precursor Exposure Time in Atomic Layer Deposition of Silicon Oxide and Silicon Nitride
117Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
118Effect of substrate temperature and Ga source precursor on growth and material properties of GaN grown by hollow cathode plasma assisted atomic layer deposition
119Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
120Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
121Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
122Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
123Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
124Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
125Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
126Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
127Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
128Effects of NH3 pulse plasma on atomic layer deposition of tungsten nitride diffusion barrier
129Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
130Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
131Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
132Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
133Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
134Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
135Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
136Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
137Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
138Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
139Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
140Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
141Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
142Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
143Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
144Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
145Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
146Evaluation of NbN thin films grown by MOCVD and plasma-enhanced ALD for gate electrode application in high-k/SiO2 gate stacks
147Evaluation of plasma parameters on PEALD deposited TaCN
148Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
149Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
150Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
151Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
152Fabrication of AlN/BN bishell hollow nanofibers by electrospinning and atomic layer deposition
153Fabrication of flexible polymer-GaN core-shell nanofibers by the combination of electrospinning and hollow cathode plasma-assisted atomic layer deposition
154Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
155Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
156Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
157Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
158Flexible Memristive Memory Array on Plastic Substrates
159Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
160Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
161Fully CMOS-compatible titanium nitride nanoantennas
162GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
163Gadolinium nitride films deposited using a PEALD based process
164GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
165Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
166Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
167Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
168Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
169Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
170Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
171Growth kinetics for temperature-controlled atomic layer deposition of GaN using trimethylgallium and remote-plasma-excited NH3
172Growth mechanism of Co thin films formed by plasma-enhanced atomic layer deposition using NH3 as plasma reactant
173Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
174Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
175Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
176HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
177High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
178High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
179High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
180High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
181High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
182High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
183High-Reflective Coatings For Ground and Space Based Applications
184Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
185Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
186Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
187Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1-xN thin films at low temperatures
188Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes
189Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
190Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
191Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
192Hydrogen plasma-enhanced atomic layer deposition of copper thin films
193Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
194Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
195Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
196Impact of oxygen plasma on nitrided and annealed atomic layer deposited SiO2/high-k/metal gate for high-voltage input and output fin-shaped field effect transistor devices
197Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
198Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
199Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
200Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
201Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
202Improved understanding of recombination at the Si/Al2O3 interface
203Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
204Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
205In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
206In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
207In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
208In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
209In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
210In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
211In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
212Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
213Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
214Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
215Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
216Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
217Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
218Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
219Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
220Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
221Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
222Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
223Infrared study on low temperature atomic layer deposition of GaN using trimethylgallium and plasma-excited ammonia
224Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
225Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
226Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
227Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
228Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
229Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
230Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
231Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
232Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
233Investigation of native oxide removing from HCPA ALD grown GaN thin films surface utilizing HF solutions
234Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
235Investigation of Tungsten Nitride Deposition Using Tungsten Hexafluoride Precursor for Via and Plug Metallization
236Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
237Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
238Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
239Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
240Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
241Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
242Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
243Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
244Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
245Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
246Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
247Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
248Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
249Low temperature temporal and spatial atomic layer deposition of TiO2 films
250Low temperature thin film transistors with hollow cathode plasma-assisted atomic layer deposition based GaN channels
251Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
252Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
253Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
254Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
255Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
256Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
257Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma
258Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
259Low-Temperature Deposition of Hexagonal Boron Nitride Via Sequential Injection of Triethylboron and N2/H2 Plasma
260Low-temperature grown wurtzite InxGa1-xN thin films via hollow cathode plasma-assisted atomic layer deposition
261Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
262Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
263Low-temperature hollow cathode plasma-assisted atomic layer deposition of crystalline III-nitride thin films and nanostructures
264Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
265Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
266Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
267Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
268Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
269Low-temperature self-limiting atomic layer deposition of wurtzite InN on Si(100)
270Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
271Low-temperature sequential pulsed chemical vapor deposition of ternary BxGa1-xN and BxIn1-xN thin film alloys
272Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
273Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
274MANOS performance dependence on ALD Al2O3 oxidation source
275Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
276Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
277Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
278Method to enhance atomic-layer deposition of tungsten-nitride diffusion barrier for Cu interconnect
279Microscopic origin of bipolar resistive switching of nanoscale titanium oxide thin films
280Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
281Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
282Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
283Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
284Nitride memristors
285Nitride passivation of the interface between high-k dielectrics and SiGe
286Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
287Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
288Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
289Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
290On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
291Optical and Electrical Properties of TixSi1-xOy Films
292Optical characteristics of nanocrystalline AlxGa1-xN thin films deposited by hollow cathode plasma-assisted atomic layer deposition
293Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
294Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
295Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
296Oxygen migration in TiO2-based higher-k gate stacks
297Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
298PEALD AlN: controlling growth and film crystallinity
299PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
300PEALD of Copper using New Precursors for Next Generation of Interconnections
301PEALD ZrO2 Films Deposition on TiN and Si Substrates
302Perspectives on future directions in III-N semiconductor research
303Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
304Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
305Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
306Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
307Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
308Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
309Plasma enhanced atomic layer deposition of Fe2O3 thin films
310Plasma enhanced atomic layer deposition of Ga2O3 thin films
311Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
312Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
313Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
314Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
315Plasma enhanced atomic layer deposition of SiNx:H and SiO2
316Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
317Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
318Plasma enhanced atomic layer deposition of zinc sulfide thin films
319Plasma Enhanced Atomic Layer Deposition on Powders
320Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
321Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
322Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
323Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
324Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
325Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
326Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
327Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
328Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
329Plasma-Assisted Atomic Layer Deposition of High-Density Ni Nanoparticles for Amorphous In-Ga-Zn-O Thin Film Transistor Memory
330Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
331Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
332Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
333Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
334Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
335Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
336Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
337Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
338Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
339Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
340Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
341Plasma-enhanced atomic layer deposition for plasmonic TiN
342Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
343Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
344Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
345Plasma-enhanced atomic layer deposition of BaTiO3
346Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
347Plasma-Enhanced Atomic Layer Deposition of III-Nitride Thin Films
348Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
349Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
350Plasma-Enhanced Atomic Layer Deposition of Ni
351Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
352Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
353Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
354Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
355Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
356Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
357Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
358Plasma-enhanced atomic layer deposition of superconducting niobium nitride
359Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
360Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
361Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
362Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
363Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
364Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
365Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
366Plasma-enhanced atomic layer deposition of tungsten nitride
367Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
368Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
369Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
370Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
371Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
372Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
373Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
374Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
375Properties of AlN grown by plasma enhanced atomic layer deposition
376Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
377Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
378Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
379Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
380Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
381Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
382Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
383Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
384Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
385Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
386Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
387Remote Plasma ALD of Platinum and Platinum Oxide Films
388Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
389Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
390Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
391Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
392Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
393Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
394Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
395Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
396Room temperature atomic layer deposition of TiO2 on gold nanoparticles
397Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
398Room-Temperature Atomic Layer Deposition of Platinum
399RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
400RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
401Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
402Ru thin film grown on TaN by plasma enhanced atomic layer deposition
403Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
404Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
405Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
406Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
407Self-Limiting Growth of GaN at Low Temperatures
408Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
409Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
410Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
411Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
412Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
413Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
414Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
415Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
416Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
417Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
418Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
419Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
420Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
421Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
422Structural and optical characterization of low-temperature ALD crystalline AlN
423Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
424Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
425Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
426Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
427Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
428Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
429Study on the characteristics of aluminum thin films prepared by atomic layer deposition
430Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
431Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
432Substrate impact on the low-temperature growth of GaN thin films by plasma-assisted atomic layer deposition
433Substrate temperature influence on the properties of GaN thin films grown by hollow-cathode plasma-assisted atomic layer deposition
434Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
435Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
436Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
437Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
438Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
439Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
440TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
441Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
442Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
443Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
444The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
445The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
446The effects of layering in ferroelectric Si-doped HfO2 thin films
447The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
448The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
449The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
450The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
451The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
452The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
453The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
454Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
455Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
456Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
457Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
458Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
459TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
460TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
461Trilayer Tunnel Selectors for Memristor Memory Cells
462Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
463Tuning The Photoactivity of Zirconia Nanotubes-Based Photoanodes via Ultrathin Layers of ZrN: An Effective Approach toward Visible-Light Water Splitting
464Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
465Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
466Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
467Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
468Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
469Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
470Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
471Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
472Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
473Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition
474Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
475Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
476X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
477ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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