Unknown Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
2Engineered Tunneling Contacts with Low-Temperature Atomic Layer Deposition of AlN on GaN
3Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
4The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
5Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
6Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
7Trilayer Tunnel Selectors for Memristor Memory Cells
8Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
9Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
10Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
11Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
12Influence of Pre and Post-treatments on Plasma Enhanced ALD SiO2 and Al2O3 layers on GaN
13Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
14Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
15Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
16Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
17Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
18Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
19Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
20PEALD YSZ-based bilayer electrolyte for thin film-solid oxide fuel cells
21Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
22ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
23Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
24Optical and Electrical Properties of TixSi1-xOy Films
25Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
26Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
27Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
28Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
29Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
30Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications
31Densification of Thin Aluminum Oxide Films by Thermal Treatments
32Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
33High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
34A high speed PE-ALD ZnO Schottky diode rectifier with low interface-state density
35Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
36Room-Temperature Atomic Layer Deposition of Platinum
37Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
38Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
39Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
40Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
41Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films