Crystallinity, Crystal Structure, Grain Size, Atomic Structure Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
2A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
3A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
4A route to low temperature growth of single crystal GaN on sapphire
5Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
6ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
7AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
8Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
9An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
10Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
11Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
12Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
13Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
14Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
15Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
16Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
17Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
18Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
19Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
20Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
21Atomic layer deposition of GaN at low temperatures
22Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
23Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
24Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
25Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
26Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
27Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
28Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
29Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
30Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
31Atomic Layer Epitaxy AlN for Enhanced AlGaN/GaN HEMT Passivation
32Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
33Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
34Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
35Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
36Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
37Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
38Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
39Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
40Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
41Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
42Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
43Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
44Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
45Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
46Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
47Comparative study of ALD SiO2 thin films for optical applications
48Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
49Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
50Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
51Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
52Comparison of trimethylgallium and triethylgallium as 'Ga' source materials for the growth of ultrathin GaN films on Si(100) substrates via hollow-cathode plasma-assisted atomic layer deposition
53Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
54Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
55Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
56Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
57Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
58Crystalline growth of AlN thin films by atomic layer deposition
59Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
60Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
61Densification of Thin Aluminum Oxide Films by Thermal Treatments
62Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
63Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
64Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
65Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
66Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
67Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
68Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
69Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
70Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
71Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
72Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
73Effect of substrate temperature and Ga source precursor on growth and material properties of GaN grown by hollow cathode plasma assisted atomic layer deposition
74Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
75Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
76Electrical characteristics of β-Ga2O3 thin films grown by PEALD
77Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
78Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
79Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
80Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
81Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
82Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
83Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
84Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
85Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
86Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
87Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
88Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
89Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
90Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
91Evaluation of plasma parameters on PEALD deposited TaCN
92Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
93Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
94Fabrication of AlN/BN bishell hollow nanofibers by electrospinning and atomic layer deposition
95Fabrication of flexible polymer-GaN core-shell nanofibers by the combination of electrospinning and hollow cathode plasma-assisted atomic layer deposition
96Fast PEALD ZnO Thin-Film Transistor Circuits
97Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
98Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
99Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
100Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
101Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
102Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
103Fully CMOS-compatible titanium nitride nanoantennas
104Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
105Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
106Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
107Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
108Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
109Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
110Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
111Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
112Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
113Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
114HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
115High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
116High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
117High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
118High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
119High-Reflective Coatings For Ground and Space Based Applications
120Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
121Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
122Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
123Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1-xN thin films at low temperatures
124Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
125Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
126Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
127Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
128Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
129In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
130In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
131In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
132In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
133Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
134Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
135Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
136Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
137Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
138Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
139Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
140Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
141Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
142Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
143Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
144Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
145Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
146Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
147Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
148Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
149Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
150Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
151Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
152Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
153Low temperature thin film transistors with hollow cathode plasma-assisted atomic layer deposition based GaN channels
154Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
155Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
156Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
157Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
158Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
159Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
160Low-Temperature Deposition of Hexagonal Boron Nitride Via Sequential Injection of Triethylboron and N2/H2 Plasma
161Low-temperature grown wurtzite InxGa1-xN thin films via hollow cathode plasma-assisted atomic layer deposition
162Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
163Low-temperature hollow cathode plasma-assisted atomic layer deposition of crystalline III-nitride thin films and nanostructures
164Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
165Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
166Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
167Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
168Low-temperature self-limiting atomic layer deposition of wurtzite InN on Si(100)
169Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
170Low-temperature sequential pulsed chemical vapor deposition of ternary BxGa1-xN and BxIn1-xN thin film alloys
171Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
172Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
173Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
174New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
175NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
176Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
177Nitride memristors
178Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
179Optical characteristics of nanocrystalline AlxGa1-xN thin films deposited by hollow cathode plasma-assisted atomic layer deposition
180Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
181Oxygen migration in TiO2-based higher-k gate stacks
182Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
183PEALD AlN: controlling growth and film crystallinity
184PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
185PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
186Perspectives on future directions in III-N semiconductor research
187Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
188Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
189Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
190Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
191Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
192Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment
193Plasma enhanced atomic layer deposition of Fe2O3 thin films
194Plasma enhanced atomic layer deposition of Ga2O3 thin films
195Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
196Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
197Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
198Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
199Plasma enhanced atomic layer deposition of zinc sulfide thin films
200Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
201Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
202Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
203Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
204Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
205Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
206Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
207Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
208Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
209Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
210Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
211Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
212Plasma-enhanced atomic layer deposition of BaTiO3
213Plasma-Enhanced Atomic Layer Deposition of III-Nitride Thin Films
214Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
215Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
216Plasma-Enhanced Atomic Layer Deposition of Ni
217Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
218Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
219Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
220Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
221Plasma-enhanced atomic layer deposition of superconducting niobium nitride
222Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
223Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
224Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
225Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
226Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
227Plasma-Modified Atomic Layer Deposition
228Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
229Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
230Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
231Properties of AlN grown by plasma enhanced atomic layer deposition
232Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
233Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
234Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
235Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
236Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
237Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
238Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
239Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
240Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
241Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
242Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
243Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
244Remote Plasma ALD of Platinum and Platinum Oxide Films
245Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
246Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
247Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
248Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
249Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
250Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
251Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
252Room-Temperature Atomic Layer Deposition of Platinum
253Ru thin film grown on TaN by plasma enhanced atomic layer deposition
254Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
255Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
256Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
257Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
258Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
259Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
260SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
261Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
262Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
263Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
264Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
265Structural and optical characterization of low-temperature ALD crystalline AlN
266Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
267Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
268Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
269Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
270Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
271Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
272Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
273Study on the characteristics of aluminum thin films prepared by atomic layer deposition
274Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
275Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
276Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
277Substrate impact on the low-temperature growth of GaN thin films by plasma-assisted atomic layer deposition
278Substrate temperature influence on the properties of GaN thin films grown by hollow-cathode plasma-assisted atomic layer deposition
279Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
280Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
281Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
282Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
283Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
284Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
285TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
286Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
287Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
288Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
289The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
290The effects of layering in ferroelectric Si-doped HfO2 thin films
291The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
292The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
293The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
294The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
295The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
296The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
297Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
298Thin film GaP for solar cell application
299Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
300TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
301TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
302Trilayer Tunnel Selectors for Memristor Memory Cells
303Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
304Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
305Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
306Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
307Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
308Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition
309Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
310Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
311X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
312ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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