Refractive Index Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Refractive Index returned 119 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
2A route to low temperature growth of single crystal GaN on sapphire
3Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
4Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
5AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
6Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
7An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
8Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
9Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
10Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
11Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
12Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
13Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
14Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
15Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
16Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
17Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
18Comparison of trimethylgallium and triethylgallium as 'Ga' source materials for the growth of ultrathin GaN films on Si(100) substrates via hollow-cathode plasma-assisted atomic layer deposition
19Composite materials and nanoporous thin layers made by atomic layer deposition
20Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
21Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
22Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
23Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
24Densification of Thin Aluminum Oxide Films by Thermal Treatments
25Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
26Effect of substrate temperature and Ga source precursor on growth and material properties of GaN grown by hollow cathode plasma assisted atomic layer deposition
27Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
28Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
29Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
30Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
31GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
32Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
33Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
34Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
35Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
36Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
37Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
38Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
39High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
40High-Reflective Coatings For Ground and Space Based Applications
41Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1-xN thin films at low temperatures
42In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
43In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
44Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
45Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
46Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
47Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
48Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
49Investigation of native oxide removing from HCPA ALD grown GaN thin films surface utilizing HF solutions
50Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
51Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
52Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
53Low temperature temporal and spatial atomic layer deposition of TiO2 films
54Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
55Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
56Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
57Low-temperature grown wurtzite InxGa1-xN thin films via hollow cathode plasma-assisted atomic layer deposition
58Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
59Low-temperature hollow cathode plasma-assisted atomic layer deposition of crystalline III-nitride thin films and nanostructures
60Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
61Low-temperature self-limiting atomic layer deposition of wurtzite InN on Si(100)
62Low-temperature sequential pulsed chemical vapor deposition of ternary BxGa1-xN and BxIn1-xN thin film alloys
63Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
64Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
65Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
66Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
67Optical and Electrical Properties of AlxTi1-xO Films
68Optical and Electrical Properties of TixSi1-xOy Films
69Optical characteristics of nanocrystalline AlxGa1-xN thin films deposited by hollow cathode plasma-assisted atomic layer deposition
70Optical properties and bandgap evolution of ALD HfSiOx films
71Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
72PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
73Plasma enhanced atomic layer deposition of Ga2O3 thin films
74Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
75Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
76Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
77Plasma enhanced atomic layer deposition of SiNx:H and SiO2
78Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
79Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
80Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
81Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
82Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
83Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
84Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
85Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
86Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
87Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
88Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
89Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
90Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
91Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
92Plasma-enhanced atomic layer deposition of superconducting niobium nitride
93Plasma-enhanced atomic layer deposition of tungsten nitride
94Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
95Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
96Properties of AlN grown by plasma enhanced atomic layer deposition
97Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
98Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
99Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
100Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
101Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
102Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
103Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
104Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
105Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
106Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
107Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
108Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
109Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
110Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
111Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
112Substrate impact on the low-temperature growth of GaN thin films by plasma-assisted atomic layer deposition
113Substrate temperature influence on the properties of GaN thin films grown by hollow-cathode plasma-assisted atomic layer deposition
114Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
115The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
116Thin film GaP for solar cell application
117Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
118Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
119ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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