Breakdown Voltage Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Breakdown Voltage returned 49 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
2AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
3Annealing behavior of ferroelectric Si-doped HfO2 thin films
4Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
5Atomic Layer Deposition of Al2O3 Thin Films for Metal Insulator Semiconductor Applications on 4H-SiC
6Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
7Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
8Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
9Densification of Thin Aluminum Oxide Films by Thermal Treatments
10Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
11Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
12Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
13Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
14Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
15Electrical characteristics and step coverage of ZrO2 films deposited by atomic layer deposition for through-silicon via and metal-insulator-metal applications
16Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
17Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
18Evaluation of NbN thin films grown by MOCVD and plasma-enhanced ALD for gate electrode application in high-k/SiO2 gate stacks
19Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
20Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
21Fast PEALD ZnO Thin-Film Transistor Circuits
22Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
23High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
24High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
25Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
26Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
27Influence of Pre and Post-treatments on Plasma Enhanced ALD SiO2 and Al2O3 layers on GaN
28Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
29Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
30Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
31Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
32Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
33Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
34Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
35Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
36Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
37Propagation Effects in Carbon Nanoelectronics
38Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
39Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
40Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
41Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
42Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
43Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
44Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
45The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
46The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
47Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
48Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
49ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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