Breakdown Voltage Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Breakdown Voltage returned 51 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
2Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
3AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
4Annealing behavior of ferroelectric Si-doped HfO2 thin films
5Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
6Atomic Layer Deposition of Al2O3 Thin Films for Metal Insulator Semiconductor Applications on 4H-SiC
7Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
8Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
9Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
10Densification of Thin Aluminum Oxide Films by Thermal Treatments
11Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
12Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
13Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
14Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
15Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
16Electrical characteristics and step coverage of ZrO2 films deposited by atomic layer deposition for through-silicon via and metal-insulator-metal applications
17Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
18Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
19Evaluation of NbN thin films grown by MOCVD and plasma-enhanced ALD for gate electrode application in high-k/SiO2 gate stacks
20Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
21Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
22Fast PEALD ZnO Thin-Film Transistor Circuits
23Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
24High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
25High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
26Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
27Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
28Influence of Pre and Post-treatments on Plasma Enhanced ALD SiO2 and Al2O3 layers on GaN
29Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
30Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
31Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
32Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
33Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
34Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
35Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
36Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
37Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
38Propagation Effects in Carbon Nanoelectronics
39Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
40Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
41Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
42Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
43Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
44Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
45Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
46The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
47The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
48Time-Dependent Breakdown Mechanisms and Reliability Improvement in Edge Terminated AlGaN/GaN Schottky Diodes Under HTRB Tests
49Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
50Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
51ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium


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