Breakdown Voltage Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Breakdown Voltage returned 48 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
2Annealing behavior of ferroelectric Si-doped HfO2 thin films
3Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
4Atomic Layer Deposition of Al2O3 Thin Films for Metal Insulator Semiconductor Applications on 4H-SiC
5Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
6Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
7Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
8Densification of Thin Aluminum Oxide Films by Thermal Treatments
9Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
10Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
11Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
12Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
13Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
14Electrical characteristics and step coverage of ZrO2 films deposited by atomic layer deposition for through-silicon via and metal-insulator-metal applications
15Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
16Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
17Evaluation of NbN thin films grown by MOCVD and plasma-enhanced ALD for gate electrode application in high-k/SiO2 gate stacks
18Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
19Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
20Fast PEALD ZnO Thin-Film Transistor Circuits
21Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
22High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
23High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
24Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
25Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
26Influence of Pre and Post-treatments on Plasma Enhanced ALD SiO2 and Al2O3 layers on GaN
27Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
28Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
29Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
30Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
31Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
32Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
33Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
34Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
35Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
36Propagation Effects in Carbon Nanoelectronics
37Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
38Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
39Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
40Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
41Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
42Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
43Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
44The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
45The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
46Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
47Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
48ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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