Publication Information

Title: Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films

Type: Journal

Info: Journal of the Korean Physical Society, vol. 53, issue 6, p. 3334

Date: 2008-10-06

DOI: http://dx.doi.org/10.3938/jkps.53.3334

Author Information

Name

Institution

Hanyang University

Hanyang University

Hanyang University

Hanyang University

Hanyang University

Hanyang University

Hanyang University

Hanyang University

Films

Plasma La2O3 using Custom

Deposition Temperature Range N/A

68959-87-5

7782-44-7

Plasma HfO2 using Custom

Deposition Temperature Range N/A

352535-01-4

7782-44-7

Plasma HfLaOx using Custom

Deposition Temperature Range N/A

352535-01-4

68959-87-5

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Leakage Current

I-V, Current-Voltage Measurements

Agilent B1500A Semiconductor Device Analyzer

Breakdown Voltage

I-V, Current-Voltage Measurements

Agilent B1500A Semiconductor Device Analyzer

EOT, Equivalent Oxide Thickness

C-V, Capacitance-Voltage Measurements

Agilent B1500A Semiconductor Device Analyzer

Hysteresis

C-V, Capacitance-Voltage Measurements

Agilent B1500A Semiconductor Device Analyzer

Capacitance

C-V, Capacitance-Voltage Measurements

Agilent B1500A Semiconductor Device Analyzer

Flat Band Voltage

C-V, Capacitance-Voltage Measurements

Agilent B1500A Semiconductor Device Analyzer

Substrates

Silicon

Keywords

Gate Dielectric

Notes

p-Si HF dipped.

Post-dep forming gas anneal at 450C.

65

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