Publication Information

Title: Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing

Type: Journal

Info: Material Science Forum, vol. 815, pp. 8-13, 2015

Date: 2015-03-20

DOI: http://dx.doi.org/10.4028/www.scientific.net/MSF.815.8

Author Information

Name

Institution

Fudan University

Fudan University

Fudan University

Fudan University

Fudan University

Fudan University

Films

Plasma RuO2 using Beneq TFS-200

Deposition Temperature = 250C

32992-96-4

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Thickness

TEM, Transmission Electron Microscope

Philips CM200-FEG

Substrates

TiN

Keywords

Interconnect

Notes

528

Disclaimer

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