Publication Information

Title: High-κ insulating materials for AlGaN/GaN metal insulator semiconductor heterojunction field effect transistors

Type: Journal

Info: Solid-State Electronics, Volume 99, September 2014, Pages 25-30

Date: 2014-04-23

DOI: http://dx.doi.org/10.1016/j.sse.2014.05.005

Author Information

Name

Institution

University of Illinois at Chicago

Films

Deposition Temperature Range N/A

Deposition Temperature Range N/A

Deposition Temperature Range N/A

Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Interface Trap Density

Unknown

Unknown

Substrates

Keywords

High-k Dielectric Thin Films

Gate Dielectric

MISHFET

Notes

Oxford Instruments FlexAL PEALD Al, Hf, and Si oxides for MISHFET dielectrics.

257

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

Follow plasma-ald.com

Follow @PlasmaALDGuy Tweet

Shortcuts



© 2014-2017 plasma-ald.com