Title: High-κ insulating materials for AlGaN/GaN metal insulator semiconductor heterojunction field effect transistors
Info: Solid-State Electronics, Volume 99, September 2014, Pages 25-30
University of Illinois at Chicago
Interface Trap Density
High-k Dielectric Thin Films
Oxford Instruments FlexAL PEALD Al, Hf, and Si oxides for MISHFET dielectrics.
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