Title: High-κ insulating materials for AlGaN/GaN metal insulator semiconductor heterojunction field effect transistors
Info: Solid-State Electronics, Volume 99, September 2014, Pages 25-30
University of Illinois at Chicago
Interface Trap Density
High-k Dielectric Thin Films
Oxford Instruments FlexAL PEALD Al, Hf, and Si oxides for MISHFET dielectrics.
I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: email@example.com
© 2014-2017 plasma-ald.com