Publication Information

Title: Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates

Type: Journal

Info: Journal of The Electrochemical Society, 156 (4) H255-H262 (2009)

Date: 2008-11-13

DOI: http://dx.doi.org/10.1149/1.3076143

Author Information

Name

Institution

IMEC

Films

Thermal Al2O3 using ASM Pulsar 2000

Deposition Temperature = 300C

75-24-1

7732-18-5

Deposition Temperature = 300C

75-24-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Keywords

Notes

198

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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