Publication Information

Title: Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy

Type: Conference Proceedings

Info: AWAD2014

Date: 2014-06-01

DOI: https://www.researchgate.net/publication/276275194_Fundamental_reaction_of_RT_gallium_oxide_atomic_layer_deposition_investigated_by_IR_absorption_spectroscopyed by IR absorption spectroscopy

Author Information

Name

Institution

Yamagata University

Yamagata University

Yamagata University

Yamagata University

Yamagata University

Films

Plasma Ga2O3 using Unknown

Deposition Temperature = 25C

1445-79-0

7782-44-7

7732-18-5

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Deposition Kinetics, Reaction Mechanism

IRAS, Infrared Reflection Absorption Spectroscopy

Unknown

Substrates

Keywords

Notes

559

Disclaimer

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