Publication Information

Title: Optical and Electrical Properties of AlxTi1-xO Films

Type: Journal

Info: Journal of the Korean Physical Society, Vol. 56, No. 1, January 2010, pp. 96-99

Date: 2009-10-12

DOI: http://dx.doi.org/10.3938/jkps.56.96

Author Information

Name

Institution

Electronics and Telecommunication Research Institute, (ETRI)

Electronics and Telecommunication Research Institute, (ETRI)

University of Science and Technology

Films

Plasma AlTixOy using Custom

Deposition Temperature Range = 150-200C

546-68-9

75-24-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Compositional Depth Profiling

AES, Auger Electron Spectroscopy

Unknown

Thickness

Ellipsometry

Unknown

Refractive Index

Ellipsometry

Unknown

Leakage Current

I-V, Current-Voltage Measurements

Unknown

Reflectivity

Unknown

Unknown

Substrates

Si(100)

ITO

Keywords

AlTiO

Plasma-Enhanced Atomic Layer Deposition

Reflectance

Thin Film Solar Cell

AR, AntiReflective Coating

Notes

40

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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