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Publication Information

Title: Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition

Type: Journal

Info: Nanoscale Research Letters 2013, 8:79

Date: 2013-01-04

DOI: http://dx.doi.org/10.1186/1556-276X-8-79

Author Information

Name

Institution

Donghua University

Donghua University

Donghua University

Donghua University

Donghua University

Films

Deposition Temperature = 90C

75-24-1

7732-18-5

Deposition Temperature = 90C

75-24-1

7732-18-5

7440-37-1

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Wetting Angle

Sessile Drop Tests

Powereach JC2000A

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Thickness

SEM, Scanning Electron Microscopy

Hitachi S-4800 Field Emission Scanning Electron Microscope

Images

SEM, Scanning Electron Microscopy

Hitachi S-4800 Field Emission Scanning Electron Microscope

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Digital Instruments Nanoscope IV

Chemical Composition, Impurities

FTIR, Fourier Transform InfraRed spectroscopy

Thermo Nicolet Nexus 640

Substrates

PET, Polyethylene Terephthalate

Keywords

Nucleation

Notes

185

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