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Enhanced non-volatile memory characteristics with quattro-layer graphene nanoplatelets vs. 2.85-nm Si nanoparticles with asymmetric Al2O3/HfO2 tunnel oxide
Type:
Journal
Info:
Nanoscale Research Letters 2015 10:248
Date:
2015-05-28
Author Information
| Name | Institution |
|---|---|
| Nazek El-Atab | Masdar Institute of Science and Technology Abu Dhabi |
| Berk Berkan Turgut | UNAM - National Nanotechnology Research Center |
| Ali Kemal Okyay | Bilkent University |
| Osama Nayfeh | UNAM - National Nanotechnology Research Center |
| Osama Nayfeh | University of Illinois - Urbana/Champaign |
Films
Plasma HfO2
Hardware used: Oxford Instruments FlexAL
Film/Plasma Properties
Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Capacitance
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Threshold Voltage Shift
Analysis: C-V, Capacitance-Voltage Measurements
Substrates
| Si(111) |
Notes
| 360 |