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Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
Type:
Journal
Info:
Applied Surface Science 357, Part A (2015) 672 - 677
Date:
2015-09-06
Author Information
| Name | Institution |
|---|---|
| Jeong Hwan Han | Korea Research Institute of Chemical Technology |
| Byoung Kook Lee | Korea Research Institute of Chemical Technology |
| Eun Ae Jung | Korea Research Institute of Chemical Technology |
| Hyo-Suk Kim | Korea Research Institute of Chemical Technology |
| Seong Jun Kim | Korea Research Institute of Chemical Technology |
| Chang Gyoun Kim | Korea Research Institute of Chemical Technology |
| Taek-Mo Chung | Korea Research Institute of Chemical Technology |
| Ki-Seok An | Korea Research Institute of Chemical Technology |
Films
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Characteristic: Morphology, Roughness, Topography
Analysis: -
Characteristic: Conformality, Step Coverage
Analysis: -
Substrates
Notes
| 475 |