Publication Information

Title: Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices

Type: Journal

Info: J. Appl. Phys. 116, 064503 (2014)

Date: 2014-07-21

DOI: http://dx.doi.org/10.1063/1.4891831

Author Information

Name

Institution

Peter-Grünberg Institute

Eindhoven University of Technology

Peter-Grünberg Institute

Eindhoven University of Technology

Eindhoven University of Technology

Peter-Grünberg Institute

Peter-Grünberg Institute

Peter-Grünberg Institute

Films

Deposition Temperature = 350C

123927-75-3

0-0-0

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Leakage Current

Unknown

Unknown

Thickness

Ellipsometry

J.A. Woollam M-2000D

Optical Properties

Ellipsometry

J.A. Woollam M-2000D

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Thermo Scientific K-Alpha

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

GIXRD, Grazing Incidence X-Ray Diffraction

PANalytical Xpert PRO MRD X-ray Diffractometer

Morphology, Roughness, Topography

SEM, Scanning Electron Microscopy

Hitachi SU-8000

Morphology, Roughness, Topography

Local-Conductivity Atomic Force Microscopy

JEOL JSPM-5200

Electrical Properties

I-V, Current-Voltage Measurements

Agilent B1500A Semiconductor Device Analyzer

Substrates

Pt

Keywords

Resistive Switch

High-k Dielectric Thin Films

Notes

Oxford Instruments FlexAL PEALD SrTiO3 for resistive switching application.

600C post deposition anneal in N2 for crystallization into perovskite structure.

258

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