Publication Information

Title: Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films

Type: Journal

Info: physica status solidi (c) Volume 12, Issue 7, pages 980-984, July 2015

Date: 2015-06-05

DOI: http://dx.doi.org/10.1002/pssc.201510016

Author Information

Name

Institution

National Research Council (CNR - Italy)

National Research Council (CNR - Italy)

National Research Council (CNR - Italy)

Università di Catania

Università di Catania

Università di Catania

National Research Council (CNR - Italy)

National Research Council (CNR - Italy)

Films

Plasma Al2O3 using Unknown

Deposition Temperature = 250C

75-24-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

TEM, Transmission Electron Microscope

Unknown

Microstructure

Electron Diffraction

Unknown

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Unknown

Bonding States

XPS, X-ray Photoelectron Spectroscopy

Unknown

Dielectric Constant, Permittivity

Unknown

Unknown

Substrates

Si(100)

AlGaN

Keywords

Notes

464

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

Follow plasma-ald.com

Follow @PlasmaALDGuy Tweet

Shortcuts



© 2014-2017 plasma-ald.com