Publication Information

Title: Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition

Type: Journal

Info: Thin Solid Films 619 (2016) 342-346

Date: 2016-10-20

DOI: http://dx.doi.org/10.1016/j.tsf.2016.10.036

Author Information

Name

Institution

Korea Institute of Machinery and Materials

Korea Institute of Machinery and Materials

Korea Institute of Machinery and Materials

Korea Institute of Machinery and Materials

Korea Institute of Machinery and Materials

Korea Advanced Institute of Science and Technology

Korea Advanced Institute of Science and Technology

Films

Deposition Temperature Range = 100-250C

75-24-1

7782-44-7

7440-59-7

Deposition Temperature Range = 100-250C

75-24-1

7782-44-7

7440-37-1

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

TEM, Transmission Electron Microscope

FEI Tecnai G2 F30

Interlayer

TEM, Transmission Electron Microscope

FEI Tecnai G2 F30

Density

XRR, X-Ray Reflectivity

PANalytical Xpert PRO MRD X-ray Diffractometer

Plasma Species

OES, Optical Emission Spectroscopy

Acton Spectra-Pro 500i

Substrates

Silicon

Keywords

Notes

977

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