Publication Information

Title: Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals

Type: Journal

Info: Surface Science 596 (2005) 1–11

Date: 2005-09-15

DOI: http://dx.doi.org/10.1016/j.susc.2005.08.019

Author Information

Name

Institution

University of California - Los Angeles (UCLA)

University of California - Los Angeles (UCLA)

Films

Plasma Y2O3 using Custom

Deposition Temperature Range = 200-400C

15632-39-0

7782-44-7

Plasma Er2O3 using Custom

Deposition Temperature Range = 200-400C

35733-23-4

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Unknown

QCM, Quartz Crystal Microbalance

Maxtek, Inc. BSH-150

Interfacial Layer

XPS, X-ray Photoelectron Spectroscopy

VG ESCALAB 5

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

VG ESCALAB 5

Thickness

XPS, X-ray Photoelectron Spectroscopy

VG ESCALAB 5

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Digital Instruments Nanoscope 3A

Conformality, Step Coverage

SEM, Scanning Electron Microscopy

Hitachi S-4700

Substrates

TaN

SiO2

Si(100)

Keywords

Beta-Diketonate

O Radicals

Thin Film

Atomic Layer Deposition

CMOS Gate Dielectric

Optical

Miniature Planar Optical Devices

Notes

50

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

Follow plasma-ald.com

Follow @PlasmaALDGuy Tweet

Shortcuts



© 2014-2017 plasma-ald.com