Publication Information

Title: High-density plasma etching characteristics of indium-gallium-zinc oxide thin films in CF4/Ar plasma

Type: Journal

Info: Thin Solid Films 583 (2015) 40-45

Date: 2015-03-23

DOI: http://dx.doi.org/10.1016/j.tsf.2015.03.054

Author Information

Name

Institution

Chung-Ang University

Chung-Ang University

Films

Plasma IGZO using Unknown

Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

SiO2

Keywords

Notes

481

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

Follow plasma-ald.com

Follow @PlasmaALDGuy Tweet

Shortcuts



© 2014-2017 plasma-ald.com