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Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
Type:
Journal
Info:
ACS Appl. Mater. Interfaces, 2016, 8 (21), pp 13590-13600
Date:
2016-05-11
Author Information
| Name | Institution |
|---|---|
| Mehr Negar Mirvakili | University of British Columbia |
| Hao Van Bui | Delft University of Technology |
| J. Ruud van Ommen | Delft University of Technology |
| Savvas G. Hatzikiriakos | University of British Columbia |
| Peter Englezos | University of British Columbia |
Films
Plasma Al2O3
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Wetting Angle
Analysis: -
Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: Cup Method
Characteristic: Water Vapor Permeability (WVP)
Analysis: Cup Method
Characteristic: Air Permeability
Analysis: Gurley Method
Characteristic: Morphology, Roughness, Topography
Analysis: Profilometry
Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Substrates
| Paper |
| Silicon |
Notes
| 787 |