Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors

Type:
Conference Proceedings
Info:
Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment Volume 831, 2016, Pages 2 - 6
Date:
2016-03-11

Author Information

Name Institution
J. HärkönenHelsinki Institute of Physics
Jennifer OttHelsinki Institute of Physics
Maarit MäkeläUniversity of Hamburg
T. ArsenovichHelsinki Institute of Physics
A. GäddaHelsinki Institute of Physics
T. PeltolaHelsinki Institute of Physics
E. TuovinenHelsinki Institute of Physics
P. LuukkaHelsinki Institute of Physics
E. TuominenHelsinki Institute of Physics
A. JunkesUniversity of Hamburg
Jaakko T. NiinistöUniversity of Helsinki
Mikko K. RitalaUniversity of Helsinki

Films

Plasma TiN


Thermal Al2O3


Film/Plasma Properties

Substrates

Notes

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