Publication Information

Title: Highly reflective polymeric substrates functionalized utilizing atomic layer deposition

Type: Journal

Info: Applied Physics Letters 107, 061602 (2015)

Date: 2015-07-28

DOI: http://dx.doi.org/10.1063/1.4928375

Author Information

Name

Institution

CIC Nanogune Consolider

IK4-Tekniker

Torresol Energy (SENER Group)

CIC Nanogune Consolider

IK4-Tekniker

IK4-Tekniker

CIC Nanogune Consolider

Films

Other TiO2 using Unknown

Deposition Temperature = 120C

546-68-9

7722-84-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Images

SEM, Scanning Electron Microscopy

Unknown

Images

Optical Microscopy

Unknown

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Unknown

Hardness

Nanoindentation

Unknown

Substrates

PTFE

Keywords

Notes

Examined O2 plasma pretreatement of Teflon prior to thermal ALD TiO2 process.

382

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