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Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
Type:
Poster
Info:
JVC-16, EVC-14, CroSloVM-23 2016, Portorož
Date:
2016-05-01
Author Information
| Name | Institution |
|---|---|
| Iva Saric | University of Rijeka |
| Robert Peter | University of Rijeka |
| Ivna Kavre Piltaver | University of Rijeka |
| Ivana Jelovica Badovinac | University of Rijeka |
| Mladen Petravic | University of Rijeka |
Films
Thermal TiO2
Plasma TiO2
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: SIMS, Secondary Ion Mass Spectrometry
Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Substrates
| Silicon |
Notes
| 1024 |