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Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 34, 01A114 (2016)
Date:
2015-10-19
Author Information
| Name | Institution |
|---|---|
| Lukas Hoffmann | University of Wuppertal |
| Detlef Theirich | University of Wuppertal |
| Tim Hasselmann | University of Wuppertal |
| André Räupke | University of Wuppertal |
| Daniel Schlamm | University of Wuppertal |
| Thomas Riedl | University of Wuppertal |
Films
Thermal Al2O3
Hardware used: Beneq TFS-200
Thermal TiO2
Hardware used: Beneq TFS-200
Film/Plasma Properties
Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: Calcium Test
Characteristic: Thickness
Analysis: Profilometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Substrates
| Silicon |
| ITO |
Notes
| 405 |