Publication Information

Title: Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition

Type: Journal

Info: Journal of The Electrochemical Society, 153(4) G353-G357 (2006)

Date: 2005-12-21

DOI: http://dx.doi.org/10.1149/1.2172556

Author Information

Name

Institution

Hanyang University

Hanyang University

Hanyang University

Hanyang University

Hanyang University

Hanyang University

Hanyang University

Films

Thermal HfO2 using Custom

Deposition Temperature Range = 250-370C

352535-01-4

10024-97-2

Plasma HfO2 using Custom

Deposition Temperature Range = 250-370C

352535-01-4

10024-97-2

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

TEM, Transmission Electron Microscope

Unknown

Microstructure

TEM, Transmission Electron Microscope

Unknown

Bonding States

XPS, X-ray Photoelectron Spectroscopy

Unknown

Chemical Composition, Impurities

AES, Auger Electron Spectroscopy

Unknown

EOT, Equivalent Oxide Thickness

C-V, Capacitance-Voltage Measurements

Keithley 590 CV Analyzer

Hysteresis

C-V, Capacitance-Voltage Measurements

Keithley 590 CV Analyzer

Fixed Charge

C-V, Capacitance-Voltage Measurements

Keithley 590 CV Analyzer

Capacitance

C-V, Capacitance-Voltage Measurements

Keithley 590 CV Analyzer

Leakage Current

I-V, Current-Voltage Measurements

HP 4155A Semiconductor Parameter Analyzer

Substrates

Silicon

Keywords

High-k Dielectric Thin Films

Doping

Notes

Substrates pirahna cleaned + DI + HF + DI + N2.

Samples annealed at 600, 800, and 1000C for 1min in N2.

PEALD HfO2 with nitrogen incorporation by using N2O plasma for reduced silicon interfacial layer formation.

150

Disclaimer

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