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Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
Type:
Poster
Info:
ALD 2011
Date:
2011-06-26
DOI:
No DOI
Author Information
| Name | Institution |
|---|---|
| Mustafa Alevli | Bilkent University |
| Çağla Özgit | Bilkent University |
| İnci Dönmez | Bilkent University |
| Necmi Biyikli | Bilkent University |
Films
Film/Plasma Properties
Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Transmittance
Analysis: -
Characteristic: Absorption Edges
Analysis: -
Characteristic: Refractive Index
Analysis: -
Substrates
Notes
| 16 |