Publication Information

Title: Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes

Type: Poster

Info: ALD 2011

Date: 2011-06-26

DOI: No DOI

Author Information

Name

Institution

Bilkent University

Bilkent University

Bilkent University

Bilkent University

Films

Plasma AlN using Unknown

Deposition Temperature Range = 100-400C

75-24-1

7664-41-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Bonding States

XPS, X-ray Photoelectron Spectroscopy

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

TEM, Transmission Electron Microscope

Unknown

Transmittance

Unknown

Unknown

Absorption Edges

Unknown

Unknown

Refractive Index

Unknown

Unknown

Substrates

Keywords

PEALD Film Development

Notes

16

Disclaimer

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