Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma

Type:
Journal
Info:
Journal of Applied Physics 109, 084333 (2011)
Date:
2011-01-16

Author Information

Name Institution
Layton BakerUniversity of Colorado, Boulder
A. S. CavanaghUniversity of Colorado, Boulder
D. SegheteUniversity of Colorado, Boulder
Steven GeorgeUniversity of Colorado, Boulder
Adriaan J. M. MackusEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology
Z. Y. LiuGeneral Motors
F. T. WagnerGeneral Motors

Films

Plasma Al2O3


Plasma Pt


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Thickness
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy

Substrates

Al2O3

Notes

691