Publication Information

Title: Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma

Type: Journal

Info: Journal of Applied Physics 109, 084333 (2011)

Date: 2011-01-16

DOI: http://dx.doi.org/10.1063/1.3555091

Author Information

Name

Institution

University of Colorado, Boulder

University of Colorado, Boulder

University of Colorado, Boulder

University of Colorado, Boulder

Eindhoven University of Technology

Eindhoven University of Technology

General Motors

General Motors

Films

Plasma Al2O3 using Custom

Deposition Temperature Range N/A

75-24-1

7782-44-7

Plasma Pt using Custom

Deposition Temperature Range = 200-300C

94442-22-5

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

J.A. Woollam M-2000D

Thickness

XRR, X-Ray Reflectivity

Bede D1

Density

XRR, X-Ray Reflectivity

Bede D1

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Physical Electronics PHI 5600 ESCA

Thickness

XPS, X-ray Photoelectron Spectroscopy

Physical Electronics PHI 5600 ESCA

Images

SEM, Scanning Electron Microscopy

Zeiss Ultra 55

Substrates

Al2O3

Keywords

Notes

691

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