Publication Information

Title: Plasma enhanced atomic layer deposition of Fe2O3 thin films

Type: Journal

Info: J. Mater. Chem. A, 2014,2, 10662-10667

Date: 2014-05-19

DOI: http://dx.doi.org/10.1039/C4TA01486C

Author Information

Name

Institution

Ghent University

Films

Plasma Fe2O3 using Custom

Deposition Temperature Range = 150-400C

1316-98-9

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

J.A. Woollam M-2000

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

VG Scientific ESCALAB 220iXL

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Bruker D8 Discover

Thickness

XRR, X-Ray Reflectivity

Unknown

Thickness

XRF, X-Ray Fluorescence

Unknown

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Bruker Dimension Edge

Substrates

Silicon

Keywords

PEALD Film Development

Notes

PEALD Fe2O3 film development.

275

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