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Plasma enhanced atomic layer deposition of Fe2O3 thin films
Type:
Journal
Info:
J. Mater. Chem. A, 2014,2, 10662-10667
Date:
2014-05-19
Author Information
| Name | Institution |
|---|---|
| Ranjith K. Ramachandran | Ghent University |
Films
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Thickness
Analysis: XRF, X-Ray Fluorescence
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Substrates
| Silicon |
Notes
| PEALD Fe2O3 film development. |
| 275 |