Device Performances Related to Gate Leakage Current in Al2O3/AlGaN/GaN MISHFETs

Type:
Journal
Info:
JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE, VOL.14, NO.5, OCTOBER, 2014
Date:
2014-07-30

Author Information

Name Institution
Do-Kywn KimKyungpook National University

Films

Plasma Al2O3

Hardware used: Unknown


Film/Plasma Properties

Substrates

Notes

204