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Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 34, 01A110 (2016)
Date:
2015-10-01
Author Information
| Name | Institution |
|---|---|
| Yu-Chang Lin | National Cheng Kung University |
| Hsin-Ying Lee | National Cheng Kung University |
| Tsung-Hsin Lee | Metal Industries Research and Development Centre |
Films
Film/Plasma Properties
Characteristic: Thickness
Analysis: Profilometry
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Electrical Properties
Analysis: -
Characteristic: Photoconductance
Analysis: -
Substrates
| Sapphire |
Notes
| 403 |