Publication Information

Title: PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor

Type: Journal

Info: Semiconductors, 2017, Vol. 51, No. 1, pp 131-133.

Date: 2016-06-08

DOI: http://dx.doi.org/10.1134/S1063782617010092

Author Information

Name

Institution

North Maharashtra University

North Maharashtra University

North Maharashtra University

North Maharashtra University

North Maharashtra University

Films

Deposition Temperature = 300C

175923-04-3

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

J.A. Woollam M-2000DI

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Unknown

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Interfacial Layer

Unknown

Unknown

Substrates

6H-SiC

Keywords

Low Power Plasma

Notes

998

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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