Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics

Type:
Journal
Info:
RSC Adv., 2016, 6, 16301-16307
Date:
2016-01-20

Author Information

Name Institution
Kaveh AhadiUniversity of Alberta
Kenneth C. CadienUniversity of Alberta

Films





Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Capacitance
Analysis: C-V, Capacitance-Voltage Measurements

Characteristic: Interface Trap Density
Analysis: C-V, Capacitance-Voltage Measurements

Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements

Substrates

Notes

799