Publication Information

Title: Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate

Type: Journal

Info: Chem. Mater., 2014, 26 (23), pp 6863-6871

Date: 2014-11-14

DOI: http://dx.doi.org/10.1021/cm503587w

Author Information

Name

Institution

Ghent University

Films

Plasma AlPxOy using Custom ICP

Deposition Temperature Range = 50-320C

75-24-1

512-56-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Unknown

OES

OES, Optical Emission Spectroscopy

Unknown

Gas Phase Species

QMS, Quadrupole Mass Spectrometer

Unknown

Gas Phase Species

FTIR, Fourier Transform InfraRed spectroscopy

Unknown

Substrates

Silicon

Keywords

Plasma-Enhanced Atomic Layer Deposition

Notes

240

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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