Title: Investigation of Tungsten Nitride Deposition Using Tungsten Hexafluoride Precursor for Via and Plug Metallization
Info: 2013 Jpn. J. Appl. Phys. 52 10MC07
Korea Institute of Science and Technology
Conformality, Step Coverage
Chemical Composition, Impurities
Abstract does not make it clear what exactly is the process. Good results with B2H6 treatment but no mention of a N-containing precursor or co-reactant.
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