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Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
Type:
Journal
Info:
Chem. Mater. 2018, 30, 663-670
Date:
2017-11-30
Author Information
| Name | Institution |
|---|---|
| Joseph A. Singh | Stanford University |
| Nick F. W. Thissen | Eindhoven University of Technology |
| Woo-Hee Kim | Chonbuk National University |
| Hannah Johnson | Toyota Motor Europe NV/SA |
| Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
| Ageeth A. Bol | Eindhoven University of Technology |
| Stacey F. Bent | Stanford University |
| Adriaan J. M. Mackus | Eindhoven University of Technology |
Films
Plasma Pt
Plasma Fe2O3
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: AES, Auger Electron Spectroscopy
Substrates
| SiO2 |
Notes
| 1064 |