The publication database currently has 1700 entries.
Use Advanced Search for more complex searches
Innatiux is a retained executive recruiting firm with a focus on the search and placement of proven leaders for client companies in the field of high-tech capital equipment and analytical instrumentation. We are seeking WW technical and business leaders with a background in semiconductor deposition to fill confidential senior and executive level positions with our clients. Visit us at: www.innatiux.com
Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
Type:
Journal
Info:
Journal of Materials Science, v. 51, n. 11, p. 5082--5091 (2016)
Date:
2016-02-03
Author Information
| Name | Institution |
|---|---|
| Hanearl Jung | Yonsei University |
| Woo-Hee Kim | Stanford University |
| Il-Kwon Oh | Yonsei University |
| Chang Wan Lee | Yonsei University |
| Clement Lansalot-Matras | Air Liquide |
| Su Jeong Lee | Yonsei University |
| Jae Min Myoung | Yonsei University |
| Han-Bo-Ram Lee | Incheon National University |
| Hyungjun Kim | Yonsei University |
Films
Plasma SiO2
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: -
Characteristic: Dielectric Constant, Permittivity
Analysis: -
Characteristic: Leakage Current
Analysis: -
Characteristic: Transistor Characteristics
Analysis: -
Substrates
| Silicon |
Notes
| 772 |