Publication Information

Title: Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films

Type: Journal

Info: physica status solidi (a) Volume 211, Issue 2, pages 389--396, 2014

Date: 2013-08-07

DOI: http://dx.doi.org/10.1002/pssa.201330101

Author Information

Name

Institution

Peter-Grünberg Institute

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Peter-Grünberg Institute

Peter-Grünberg Institute

Films

Deposition Temperature = 350C

0-0-0

123927-75-3

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

GIXRD, Grazing Incidence X-Ray Diffraction

Unknown

Band Gap

Unknown

Unknown

Leakage Current

Unknown

Unknown

Capacitance

Unknown

Unknown

CET, capacitance equivalent thickness

Unknown

Unknown

Voltage Nonlinearity Factor

Unknown

Unknown

Chemical Composition, Impurities

Ellipsometry

Unknown

Substrates

Pt

Keywords

Notes

612

Disclaimer

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