Publication Information

Title: Fast PEALD ZnO Thin-Film Transistor Circuits

Type: Journal

Info: IEEE TRANSACTIONS ON ELECTRON DEVICES, VOL. 57, NO. 2, FEBRUARY 2010

Date: 2009-12-15

DOI: http://dx.doi.org/10.1109/TED.2009.2037178

Author Information

Name

Institution

The Pennsylvania State University

The Pennsylvania State University

The Pennsylvania State University

The Pennsylvania State University

Films

Plasma ZnO using Custom

Deposition Temperature Range N/A

557-20-0

10024-97-2

Plasma Al2O3 using Custom

Deposition Temperature Range N/A

75-24-1

124-38-9

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Unknown

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Unknown

Photoluminescence

PL, PhotoLuminescence

Unknown

Leakage Current

I-V, Current-Voltage Measurements

Unknown

Breakdown Voltage

I-V, Current-Voltage Measurements

Unknown

Capacitance

C-V, Capacitance-Voltage Measurements

Unknown

Dielectric Constant, Permittivity

C-V, Capacitance-Voltage Measurements

Unknown

Mobile Charge Density

C-V, Capacitance-Voltage Measurements

Unknown

Flat Band Voltage Shift

Custom

Unknown

Substrates

Cr

Al2O3

Keywords

TFT, Thin Film Transistor

TCO, Transparent Conducting Oxide

ZnO

Notes

Thermal Al2O3 films used for passivation.

Al2O3 patterned in 80C phosphoric acid.

ZnO patterned in dilute HCl.

101

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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